Microstructure formation and high temperature oxidation behavior of Ti-Al-Cr-Y-Si coatings on TiAl
نویسندگان
چکیده
The paper presents the application of Closed Hollow Cathode Physical Vapor Deposition (CHC-PVD) method for depostion Ti-Al-Cr-Y-Si coatings on ?-TiAl 48-2-2 alloy high temperature oxidation protection. study concerned analysis coating’s growth mechanism, initial microstructure as well phase transformations investigations using resolution Scanning Transmission Electron Microscopy (STEM) and X-ray diffraction (HT-XRD). coated was subjected to test at 850 °C where a fivefold lower mass gain compared bare observed. Detailed microstructural allowed characterize thermally grown oxide scale, which found be composed nanometric layers titania, equiaxed (Al,Cr)2O3 columnar alumina. These provided evidence Cr effect formation Al2O3, postulated previously. Yttrium segregate grain boundaries alumina scale during oxidation, indicating occurence reactive element effect.
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ژورنال
عنوان ژورنال: Applied Surface Science
سال: 2021
ISSN: ['1873-5584', '0169-4332']
DOI: https://doi.org/10.1016/j.apsusc.2021.150191